X-ray circular magnetic dichroism is used to image magentization of magentic layers. Measurements in the EUV range, allows element selective imaging at the absorbtion edges of common materials as Fe,Co and Ni.
Measuring the specular reflectivity of a layered sample at various wavelengths and incidence angles, one can determine the key parameters of every layer, namely thickness, density, chemical bonds and local symmetry. Our Panter setup offers this measurements in a compact, laboratory-scale device.
Scatterometrie is a methode to investigate periodic structures on surfaces. The short wavelength of EUV light enables on to make even nanometer small errors in the surface structure visible and investigate normally transparent materials.
Imaging with extreme ultra violett light overs high spatial resolution in combination with element selectivity. To overcome the absent of cheap and/ or good optics, our group investigates the lens less technique of coherent diffraction imaging (CDI).
Optics used for EUV light, e.g. in the lithography industry, needs to be characterized before putting them to use. Dark-field microscopy offers detection of phase and amplitudes errors only visible by light in the EUV range.
In many applications the brilliance is the limiting factor to the achievable resolution and required time per measurement. Here we investigate the interaction of pinch plasma sources with laser heating.
Photo electron microscopes enables investigations of structure, magnetic properties, composition and morphology of matter. Our high-power EUV plasma sources closing the gap in light sources between X-ray and UV light.