Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

SPIE (2017) [Contribution to a book, Contribution to a conference proceedings]

International Conference on Extreme Ultraviolet Lithography 2017 : [Proceedings] - SPIE, 2017. - ISBN 97815106137449781510613751 - doi:10.1117/12.2280582

Authors

Selected Authors

Brose, Sascha Manuel
Danylyuk, Serhiy
Bahrenberg, Lukas
Loosen, Peter
Juschkin, Larissa

Other Authors

Lebert, Rainer
Gargini, Paolo A.
Ronse, Kurt G.
Naulleau, Patrick P.
Itani, Toshiro

Identifier