Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

Bellingham, Wash / SPIE (2017) [Contribution to a book, Contribution to a conference proceedings]

[International Conference on Extreme Ultraviolet Lithography, 2017-09-11 - 2017-09-14, Monterey, California, USA]


Selected Authors

Brose, Sascha Manuel
Danylyuk, Serhiy
Bahrenberg, Lukas
Lebert, Rainer
Loosen, Peter

Other Authors

Juschkin, Larissa