Academic Profile


The spectral range of the extreme ultraviolet radiation (EUV/XUV, 1 - 50 nm) combines the advantages of small wavelength and strong ligth-matter interaction at atomic resonances. This enables lateral resolution with high depth of focus in the nanometer scale and on at the same time elemental contrast.

The teaching and research area experimental physics of extrem ultraviolet investigates multiple aspects in the context of EUV radiation. Starting from production of bright light source, characterization of wavepropagation and matter interaction reaching to concret application and method development with a focus on high brigthness sources and interference lithography.

Conducted reasearch is described by four aspects:

Metrology and Imaging

EUV Interference Lithography

Laser heated discharge plasma

Photo-electron Emission Spectroscopy and Microscopy

Research is done in cooperation with Peter Grünberg Institut PGI , Forschungszentrum Jülich, in particularly PGI-9: Semiconductor-Nanoelectronis (Prof. Detlev Grützmacher), the Fraunhofer Institute for Laser Technology ILT in Aachen and the Chair for Technology of Optical Systems TOS, RWTH Aachen (Professor Peter Loosen). We are a member of the section JARA-FIT of the Jülich-Aachen Research Alliance.